An optimization method for ion etching yield modeling combined with factual etching data

Abstract

The profile surface simulation is an important method to study the ion etching mechanism. In profile surface simulation, the result of surface evolution is primarily determined by the surface evolution model and the etching yield optimization model as well. However, the currently available surface evolution model is not accurate enough. What's more, most of the data used in etching yield optimization model are based on simulation, while no factual data are used to optimize the parameters of ion etching yield model. In order to solve these problems, the accuracy of current evolution model is improved, the optimal objects of etching yield model are redefined, and the factual etching data are introduced to optimize the etching yield model for the first time. In this paper, parallel method is also adopted to speed up the optimization process, whose optimized parameters are then applied to the etching simulation process that is based on cellular automata. The experimental results show that our proposed approach does improve the accuracy of simulation and greatly shorten the optimization process.