Abstract
Recent studies have shown that the target poisoning often encountered during sputter-deposition of oxides could be controlled by means of a low-frequency modulation of the discharge power. In order to understand the basic mechanisms resulting in improvement of the deposition rate of stoichiometric oxides such as TiO 2, optical emission spectroscopy (OES) measurements have been carried out in both stable and unstable sputtering conditions. The current study shows that stoichiometric coatings can be synthesised even if they are periodically submitted to an under-stoichiometric flow of particles at the end of the step ‘high’ of the modulation. This suggests the existence of a characteristic time compatible with the diffusion kinetics of chemisorbed oxygen atoms m the under-stoichiometric layer of the deposit created.
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