Abstract
最优插值(Optimal Interpolation, OI)同化是一种利用最小二乘法使分析误差方差极小化的方法. 提出并建立了一种电离层一维剖面最优插值的同化方法. 借鉴及参考气象的同化方法, 基于最优插值方法, 采用厦门电离层垂测仪2009年6至8月观测数据和一维电离层理论模式(IGGCAS1D)背景值来构建误差协方差, 并进行同化试验和分析预报. 结果表明方法可靠, 没有出现同化时背景数据与观测数据偏离较大的问题, 同化后所得结果与观测数据符合较好.
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