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Abstract
Ni films were deposited by magnetron sputtering with a relatively high deposition rate (0.5nm/s). We have investigated the structure and magnetic properties of Ni films with different thicknesses. Strongly reduced magnetization has been found in the as-deposited Ni film. Our structural investigation (high-resolution TEM, EXAFS) reveals the presence of amorphous structure. The crystallinity increases with increasing film thickness, accompanied by an increase of magnetization. In 15nm film or below, circular crystallites were found after annealing at 500°C. Anisotropic magnetoresistance (AMR) has been observed and it is strongly dependent on the microstructure.
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