Abstract
Potential sweep techniques were used to investigate the anodic behaviour of reduced ruthenium surfaces, prepared by electrodeposition on gold-plated substrates, as a function of sweep rate, temperature and pH. The most important factor appeared to be pH as this strongly influenced the oxide layer thickness and both the number and location of the peaks on the voltammogram. The formation of thin oxide films on ruthenium at intermediate pH values (3.5–9.5) is attributed to the growth of a compact amorphous film with significant metal-oxygen-metal bridging in the structure. Heavier oxide growth in strong acid is attributed to protonation of the oxide lattice resulting in the formation of a more porous anodic film. Thicker oxide growth in strong base is attributed to the growth of a higher (+6) oxide under these conditions. The effects of both sweep rate and temperature on anodic behaviour in strong acid are attributed to activation-controlled rearrangement of the oxide film.
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