An Intelligent Supervision System for the Ion Implementation in IC Fabrication Processes

Abstract

This paper presents a real-time intelligent supervision system for IC ion implantation processes. A hardware interface is developed to directly extract the features from the 2-D analog image signals of a beam map. A qualitative model for the beam scanning is then obtained and the symptoms of abnormal operations can be analyzed to achieve on-line diagnosis. Furthermore, a fuzzy expert system is developed to advise operators taking appropriate adjustment for the beam scanning. This supervisory system has been implemented on Eaton NV-6200 A/AV ion implanters at the Taiwan Semiconductor Manufacturing Company.