An integrated theory of whisker formation: the physical metallurgy of whisker formation and the role of internal stresses

Abstract

Over 50 years of whisker research (cadmium, zinc, and tin) has not resulted in consensus about whisker formation fundamentals for metal films. New analytical tools have recently provided new insights into microstructural changes that occur during whisker formation. Integration of these newer observations with historical data led the authors to propose an Integrated Theory of Whisker Formation. The Integrated Theory incorporates physical attributes such as microstructure and internal stress states. Particular emphasis is placed on recrystallization, grain boundary diffusion, film-substrate interdiffusion (i.e., the Kirkendall effect), and stress gradients. The Integrated Theory does not require dislocation mechanisms for material transport to the whisker location. Material is transported to a whisker grain by the surrounding grain boundary network under the driving impetus of positive stress gradients. Transported atoms then move from the grain boundary network into the whisker grain. This movement into the whisker grain pushes the free surface of the whisker grain upward and, thereby, grows the whisker structure.