An insight into wax/asphaltene deposition behavior in the wellbore regions of gas condensate reservoirs

Abstract

Wax/asphaltene deposition has been an important problem in the gas condensate reservoirs development. The cold plate device is designed to reveal the effect of operating conditions on the wax/asphaltene deposition behavior. The characteristic of wax/asphaltene deposition with well conditions is determined. The results show that when the temperature difference was considered, the growth rate of wax deposition thickness in the operation period was that stabilizing first, rising again, and then slowing down. However, the temperature and hydrogen bonding interaction significantly affects the asphaltene deposition process. The asphaltene deposition rate was stable at the beginning period of operation, then increased significantly, and decreased gradually after reaching the peak value of 21.61 g/cm2·h. An identification diagram of the wellbore deposition location is established. Increased deposition surface area of the cold plate structural design ensures qualitative and quantitative characterization of wax/asphaltene deposition traits. The real well fluids components were employed in the experiments to obtain critical conditions for wax/asphaltene deposition which approximated actual production conditions. This diagram facilitates the reliable identification of wax/asphaltene removal areas in the wellbore during production. This study provides a comprehensive understanding of the wax/asphaltene deposition behavior, which helps the gas condensate well operation safety and efficiency.