An innovative approach to control the Hf/Ti ratio in monolayers grown via atomic partial layer deposition

Abstract

The Hf/Ti ratio was precisely controlled at monolayer thickness using atomic partial layer deposition (APLD). HfxTi1−xO2 films with varying Hf concentrations were deposited by adjusting the pulse time of Hf precursors within a single atomic layer. Characterization using x-ray reflectivity, x-ray photoelectron spectroscopy, and spectroscopic ellipsometry confirmed the presence of Hf, Ti, and O in the films. Increasing the Hf content caused the binding energies of the O 1s peak to shift to higher values, indicating a chemical environment change from TiO2-like to HfO2-like. A higher Hf content also increased the relative atomic percentages of Hf, Ti, and O, altering the film properties. The mass density and optical properties were notably sensitive to changes in the Hf/Ti ratio at monolayer thickness. The potential of APLD to reduce dimensionality through precise control of both thickness and composition renders it especially appropriate for applications requiring highly specific material properties.