An influence of ion and sputtered atom flows inhomogeneity on time evolution of the target surface relief in glow discharge

Abstract

A mathematical model of ion and sputtered atom transport in the vicinity of the target with a periodical surface relief in glow discharge in pure gas is developed. Under the assumption that the relief amplitude is small, analytical expressions for their flows are found by the perturbation method and an equation describing the relief amplitude time evolution is derived. It is shown that intensity of sputtering exceeds intensity of sputtered material re-deposition at the relief tops, and relief smoothing always takes place in the process of homogeneous target treatment in glow discharge in pure gas.