Abstract
The advanced manufacturing of ultra-thin-film devices, especially the nano-semiconductor products, has drawn a significant research interest over the past decades. In this field, monitoring the properties and thickness of the semiconductor layers is of paramount importance, which has significant impact on the device quality. In this study, an in situ monitoring scheme for manufacturing of nanodevices has been proposed, which is able to accurately analyse the optical absorption properties of the semiconductor layers of varying thickness in nanodevices. The in situ reflectance spectral analysis of monolayer, bilayer, and bulk-phase samples confirms the practicability and reliability of the monitoring scheme. The findings reported in this study form the basis for the advanced manufacturing of nano- and sub-nanodevices in the future.
Highlights
The advanced manufacturing technologies have drawn a significant in recent years, including intelligent sensing, artificial intelligence, advanced monitoring, and other smart information technologies [1–6]
In order to satisfy the device functions and improve the production quality, a monitoring scheme, which is able to analyse the optical properties of thin films with different thicknesses, is essential for the advanced manufacturing of nano- and sub-nanodevices, especially the devices based on the structure of 2D/ organic thin films which have been mentioned above
An in situ microarea differential reflectance spectroscopy (DRS) scheme has been applied to investigate the dependence of the absorption properties on the thickness of the Me-PTCDI films on the hexagonal boron nitride (h-BN) surface, which is a typical structure contained in the nanodevices
Summary
The advanced manufacturing technologies have drawn a significant in recent years, including intelligent sensing, artificial intelligence, advanced monitoring, and other smart information technologies [1–6]. The nanodevices based on two-dimensional (2D) materials have attracted great attention owing to their extraordinary properties, becoming the focus of research in the field of nanodevice manufacturing [11–16]. Considering material structure for nanodevices, the hybrid systems consisting of 2D and organic semiconductor thin films have sparked new research directions [17–21], and the combination of the advantages of both 2D and organic materials [22–24] has been widely considered to be promising for developing the novel nanodevices in the future. The structures comprising van der Waals (vdW) epitaxial organic semiconductor films with controllable layers on the 2D material surface have emerged as one of the prime research highlights, as the properties and performance of the nanodevices based on such structures effectively correlate with the thickness of the organic layers [25–28]. In order to satisfy the device functions and improve the production quality, a monitoring scheme, which is able to analyse the optical properties of thin films with different thicknesses, is essential for the advanced manufacturing of nano- and sub-nanodevices, especially the devices based on the structure of 2D/ organic thin films which have been mentioned above
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