Abstract
A number of spin-on glasses (SOG) have been investigated with respect to their suitability for submicron pattern generation in a trilevel process for optical lithography. Some of them can be significantly improved so as to permit baking of both the bottom polymer and SOG at temperatures below 200 °C without the formation of cracks and allowing the use of inorganic developers. A trilevel resist system has been used in combination with a high numerical aperture lens (Zeiss lens 10-78-02, NA=0.42, λ=436 nm) for generation of 0.5 μm lines and spaces over 1 μm SiO2 and aluminum steps.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
