Abstract
AbstractThe use of a surface developer, pyrocatechol, to process transmission electron microscope negatives has been shown to have significant advantages over the conventional D‐19 process. The process described here is tolerant of a large margin of error in the electron exposure and produces a negative that not only retains details both in the highlight as well as the faint regions, but also preserves local contrast. These characteristics are particularly useful in convergent beam electron diffraction applications where one encounters a wide contrast range. Improved acuteness and an enhanced signal to noise ratio due to the prolonged exposures associated with this process have also been observed.
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