Abstract
The effects of etch product layer on (a) the etch pit diameter and (b) the general etching velocity, V g, have been studied in a number of Solid State Nuclear Track Detectors. Observations were made under various etching conditions and attempts were made to reduce the adverse effects of the etched product layer. The results show that (a) the effect of the etch product formation is more serious in the case of oblique tracks (as compared with perpendicular or near perpendicular ones) and (b) the method of mechanical brushing of the detector surface during the etching process is quite effective in removing this layer.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
