Abstract
An experimental comparison of rotational temperatures determined from optical emission spectroscopy (OES) of with the gas kinetic temperature is reported. A positive column discharge in a high-temperature oven is used. The oven temperature, determined with a thermocouple, provides a lower bound for the gas kinetic temperature. A thermal conduction calculation using the total power input to the discharge provides an upper bound for the gas kinetic temperature. A range of gas temperatures and pressures is explored. Two bands of molecular hydrogen were examined: the R branch of the G (0,0) band and the R branch of the (0,0) Fulcher band. Measurements of the rotational temperature using emission from the band fall within the gas kinetic temperature bounds for temperatures above . Data from the Fulcher band do not show a correlation with the gas temperature and give a constant rotational temperature independent of oven temperature.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
