Abstract

With strict wafer residency time constraint and activity time variation, it is very difficult to operate a cluster tool and to check if a given schedule is feasible. To solve this problem, simulation is an effective way. A cluster tool is reconfigurable and can be used to process different types of wafers. The wafer flow pattern and processing times for different type of wafers are different. Thus, to simulate a cluster tool, a simulation system called virtual cluster tool that can adapt to the variation of wafer flow patterns and processing times is necessary. In this paper, a virtual single-arm cluster tool is developed by using eM-Plant simulation platform. With parameterization, this system can be used for any wafer flow pattern. It is a 3-dimension model such that it is visualized. Examples are presented to demonstrate the applications of the simulation model.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call