Abstract
The low yield rate of ITO thin-films is well known in semiconductor production processes. In the current study, an electrode sets with a cylindrical cathode and a platy anode as a reclamation process for the nanoscale removal of the indium tin oxide (ITO) nanostructure from the color filter surface of TFT-LCD displays is presented. In the current experiment, the major interest lies in the features of the technology and the design of the cylindrical cathode and the platy anode for the electrochemical etching process. For this process a steep gradient of the platy anode provides large discharge mobility and a better removal effect. A thin platy anode, a small gap-width between the cylindrical cathode and the ITO surface, or a high flow rate of electrolyte corresponds to a higher removal rate of the ITO-layer. A large current flow combined with a high feed rate of the display also results in a fast removal rate. By establishing a recycling process for the ultra-precise removal of the thin-film nanostructure, the optoelectronic semiconductor industry can effectively recycle defective products with a reduction of both production costs and pollution.
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