An Electrical Impedance-Based Technique to Infer Plasma Density in a 13.56-MHz Magnetized Capacitive Coupled RF Discharge

Abstract

Plasma density in a magnetized, capacitive-coupled, radio frequency (RF) discharge has been determined using the electrical impedance characteristics of the discharge. The effective impedance between the parallel plate electrodes has been treated as an equivalent electric circuit consisting of resistive and reactive components, expressed in terms of high-frequency plasma conductivity. Hence the model is used to connect the externally measured RF voltage, current, and their relative phase to plasma density. Additionally, a triple Langmuir probe (TLP) is used to substantiate the results of the electrical impedance model. The plasma density obtained using the direct probe measurement is found to be in good agreement with those determined from the passive measurements based on electrical impedance of the discharge as outlined in this article.