An efficient material removal rate prediction model for cemented carbide inserts chemical mechanical polishing

Abstract

Aiming at the defects of cemented carbide inserts surfaces produced in the conventional grinding process, a cemented carbide inserts chemical mechanical polishing (CMP) process is developed to reduce the insert rake face roughness for the improvement of cutting performance. Especially, an efficient material removal rate (MRR) prediction model for cemented carbide inserts CMP is established considering synthesized effects of multi-factors characteristics such as abrasive particles, the polishing pad, and cemented carbide inserts. Firstly, the contact mechanism between the cemented carbide insert and the polishing pad is analyzed by using the Greenwood and Williamson elastic model. Then the contact model between the abrasive particle and the polishing pad is established based on the Sneddon's hyper-elastic micro-contact mechanics, and the contact model between the abrasive particle and the cemented carbide insert is built by applying the elastic-plastic micro-contact mechanics. Finally, an efficient MRR prediction model is proposed. The experimental results show that when changing the polishing pressure and the polishing disk rotational speed individually, the MRR average error between the predicted value and the experimental value is 1.65% and 2.18%, respectively. This study demonstrates that the proposed model can contribute to CMP preparation of high-performance cemented carbide tools/inserts.