Abstract
We propose an isogeometric approach to model the deformation of active thin films using layered, nonlinear, Kirchhoff–Love shells. Isogeometric Collocation and Galerkin formulations are employed to discretize the electrophysiological and mechanical sub-problems, respectively, with the possibility to adopt different element and time-step sizes.Numerical tests illustrate the capabilities of the active-stress-based approach to effectively simulate the contraction of thin films in both quasi-static and dynamic conditions.
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