Abstract
Directed self-assembly (DSA) complemented with multiple patterning (MP) is an attractive next generation lithography (NGL) technique for contact-hole generation. Nevertheless, a high-quality DSA-aware layout decomposer is required to enable the technology. In this article, we introduce an efficient method which incorporates a set packing for generating DSA template candidates and a local search method. Besides, a multi-start strategy is integrated into the framework to prevent the local minima. Our framework encourages the reuse of existing coloring solvers. Hence, the development cost can significantly be reduced. In addition, for DSA multiple patterning where the number of masks is larger than two, we present an efficient iterative partition based method. Experimental results show that compared with the state-of-the-art work, our methods can achieve roughly 100× speedup for double patterning, and 78.8% conflict reduction with 5× speedup for triple patterning on the dense graphs.
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