Abstract
A plasma source is developed to create broad thin films. Instead of generating large plasmas, substrates will be scrolled in uniform sheet plasmas to extend the process area. The plasmas are generated by electron cyclotron resonance; microwaves are radiated from a rectangular waveguide with a slot on its E-plane. This slot antenna is put between two permanent magnets. Their poles face each other so that a cusp field is formed in front of the slot. Plasmas are generated with gas; plasma parameters are measured by the Langmuir probe method and visible-range spectroscopy. The density uniformity is 9% within 20 cm length when a short plunger terminates the slot antenna. Spectra of bands and oxygen atomic lines are observed.
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