Abstract
This paper introduces an automated optical on-wafer probing system based on an external electro-optic sampling @OS) for diagnosing ultra-high-speed ICs at internal nodes. Automatic EO probe tip positioning, module-based system architecture, and a workstationdriven environment make the system easy to use, and improve measurement accuracy and reproducibility. Voltage sensitivity on an order of 1 mV/d(Hz) at frequencies up to 70 GHz is routinely obtained for ICs fabricated on any substrate. The system has been successfully applied to internal node probing of on-wafer ICs operating at over 10 Gbit/s.
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