An atomic force microscope integrated with a helium ion microscope for correlative nanoscale characterization

Georg E Fantner,Mustafa Kangül,Gregor Hlawacek,Charlène Brillard,Stefan Hummel,Santiago H Andany

doi:10.3762/bjnano.11.111

Abstract

In this work, we report on the integration of an atomic force microscope (AFM) into a helium ion microscope (HIM). The HIM is a powerful instrument, capable of imaging and machining of nanoscale structures with sub-nanometer resolution, while the AFM is a well-established versatile tool for multiparametric nanoscale characterization. Combining the two techniques opens the way for unprecedented in situ correlative analysis at the nanoscale. Nanomachining and analysis can be performed without contamination of the sample and environmental changes between processing steps. The practicality of the resulting tool lies in the complementarity of the two techniques. The AFM offers not only true 3D topography maps, something the HIM can only provide in an indirect way, but also allows for nanomechanical property mapping, as well as for electrical and magnetic characterization of the sample after focused ion beam materials modification with the HIM. The experimental setup is described and evaluated through a series of correlative experiments, demonstrating the feasibility of the integration.

Highlights

After the invention of the atomic force microscope (AFM) in 1986 [1], efforts were made towards combining this scanning probe microscopy technique with electron beam and ion beam techniques for correlative nanoscale characterization and nanoscale fabrication
The helium ion microscope (HIM) offers a large field of view, which allows for the cantilever to be navigated onto the region of interest (Figure 2b,c) to perform AFM topography imaging (Figure 2d)
Chain scission leads to volume loss through the release of gas molecules, and this leads to the shrinkage of exposed poly(methyl methacrylate) (PMMA) [32], which can be quantified using AFM

Summary

Introduction

After the invention of the atomic force microscope (AFM) in 1986 [1], efforts were made towards combining this scanning probe microscopy technique with electron beam and ion beam techniques for correlative nanoscale characterization and nanoscale fabrication. First time, enabling correlative imaging on electrically insulating samples. In this first attempt, the readout of cantilever deflection was achieved using the electron beam itself. More advanced and versatile combined instruments have been proposed for a broad spectrum of applications in nanoscale characterization and nanoscale fabrication inside SEM and focused ion beam (FIB) setups [7,8,9,10,11]

Results

Discussion

Conclusion