Abstract
An experimental approach has been developed in order to follow adsorption and desorption processes of volatile organic contaminants on double-side polished silicon wafers covered with native oxide film. This setup is based on three principal components: a stable gas-phase generator, a flow tube reactor, and a state-of-the-art proton-transfer-reaction–mass spectrometry analytical device as a gas-phase composition detector. Isopropanol was chosen as a model compound because it is largely found in the atmosphere of clean rooms. The gas-surface equilibrium on wafers and adsorption and desorption rate constants of isopropanol were measured at and 30% relative humidity. The following adsorption and desorption rate constants were obtained at different gas-phase concentrations: and at , and at , and at , and at , and and at .
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