Abstract
A generalized 4 × 4 matrix method for solving for the propagation of electromagnetic plane waves in optically isotropic and anisotropic stratified media has been extended to calculate the relative Kerr or Faraday intensities for most optical arrangements. The utility of this method lies in its versatility. The layered structures may consist of magnetic metals, non-magnetic metals, insulators, or semiconductors. For a given light scattering arrangement, the reflectivity, Kerr rotation, Kerr ellipticity, Faraday rotation, and Faraday ellipticity may be calculated as functions of the incidence angle, laser frequency, overlayer coverage, or underlayer thickness. Experimental intensity measurements can be checked for different configurations of the light-polarizing and beam-modulating optics.
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