Abstract
Highly reliable AlGaAs lasers with dry etched mirrors have been successfully fabricated with an ultrahigh-vacuum in situ processing system, equipped with reactive ion-beam etching (RIBE) and dielectric film deposition chambers. Etched mirror surfaces are protected against air-exposure contamination and nonvolatile-reaction-products adsorption with in situ Al/sub 2/O/sub 3/ passivation subsequent to the CI/sub 2/ RIBE mirror formation. Ion-bombardment-induced damage is repaired by thermal annealing. The annealing effect is enhanced by a contamination-free interface between the etched mirror surface and Al/sub 2/O/sub 3/ passivation film. The lasers exhibit an increase in catastrophic optical damage (COD) level and long-life operation. Their COD levels are twice as high as that for as-etched lasers and are almost the same as those for conventional cleaved lasers. >
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