Abstract
The reactants, clusters, transition structures, and products for the various channels for the thermal decomposition of SiH 4-n F n were optimized at the HF/6-31G * level. The electron correlation contributions were calculated at MP4/6-31G * and MP4/6-31G ** levels. In the decomposition of SiH 4 , SiH 2 +H 2 is favored over SiH 3 +H
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