Abstract
TiO2 films have been grown on Si(100) substrates via pulsed laser deposition. Amorphousness has been achieved for films <30 nm due to the large film-substrate lattice mismatch. With the increased film thickness, crystallization occurs and the amorphous TiO2 evolves into the anatase and rutile phases. Compared with the crystallized phases, the amorphous structure contains more oxygen vacancies (Vo) for large room temperature ferromagnetism. Significant magnetization (up to 180.4 emu/cc) has been achieved for the film in the complete amorphous state. Theoretical calculations indicate that the magnetic moments distribute around the Ti3+ ions induced by Vo in the amorphous structure.
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