Abstract
We report on recent progress on the theoretical description of amorphous thin film growth generated by physical vapor deposition. Specifically, we motivate a minimal model for the spatio-temporal evolution of the surface morphology that incorporates the dominant relaxation mechanisms of the deposition and agglomeration process. The characteristic statistical measures of the surface morphology such as the correlation length and the surface roughness calculated from this model show very good agreement with available experimental data and, therefore, support the validity of the modeling approach.
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