Abstract
Changes in amorphous regions of sputtered B 2O 3-Na 2O-Al 2O 3 film with sputtering power, sputtering time and substrate temperature were investigated. The amorphous regions range from Na 2O = 0 to 78.8 mol% in B 2O 3-Na 2O under a sputtering power of 100 W, sputtering time 20 h and substrate temperature 90°C. Decreasing the sputtering power from 100 to 50 W and decreasing the sputtering time from 20 to 5 h expanded the amorphous regions, and increasing the substrate temperature from 90 to 250°C reduced the amorphous regions. These results were compared with the variation of the critical cooling rate for glass formation from the melt system. The thermal stability of sputtered amorphous films was evaluated from the ratio T C/ T L, where T C is the crystallization peak temperature of the DTA curve and T L is the liquidus temperature. The composition Al 2O 3 = 25 mol% proved to be the most stable while Al 2O 3 = 100 mol% is the least stable in the 0.6B 2O 3 · 0.4Na 2O-Al 2O 3 system.
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