Abstract
Recent results on the composition, structural characterization and mechanical properties of amorphous hydrogenated carbon-nitrogen films (a-C(N):H) deposited by plasma enhanced chemical vapor deposition (PECVD) have been discussed. The use of different nitrogen-containing gases, ammonia, methylamine or nitrogen itself, combined with methane or acetylene, results in films with similar microstructures. As a general rule, the incorporation of nitrogen into the amorphous network increases with the partial pressure of the nitrogen-precursor gas at the expense of the carbon content. This increase is followed by a substantial reduction of the deposition rate. The nitrogen incorporation also reduces both the compressive internal stress and the fraction of carbon atoms in a sp3 state of hybridization. The stability of those films when submitted to thermal annealing or to energetic ion bombardment is also discussed.
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