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Abstract
Amorphous hydrogenated carbon-nitrogen alloy (a-CNx:H) thin filmshave been deposited on silicon substrates by improved dc magnetronsputtering from a graphite target in nitrogen and hydrogen gasdischarging. The films are investigated by using Ramanspectroscopy, x-ray photoelectron spectroscopy, spectralellipsometer and electron spin resonance techniques. The optimizedprocess condition for solar cell application is discussed. Thephotovoltaic property of a-CNx:H/silicon heterojunctions can beimproved by the adjustment of the pressure ratio of hydrogen to nitrogen andunbalanced magnetic field intensity. Open-circuit voltage and short-circuitcurrent reach 300 mV and 5.52 mA/cm2, respectively.
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