Abstract
Method of high-frequency ion-plasma (RF) sputtering of graphite target in the atmosphere of argon, methane and hydrogen with various ratios was used to synthesize amorphous hydrogenated carbon films (a-C:H) at low power of RF discharge in wide range of temperature and pressure of gas mixture from 0.5 to 0.9 Pa. Structural analysis by methods of atomic force microscopy and Raman spectroscopy showed significant dependence of films structure on thermodynamic and kinetic parameters of synthesis. Change of optical band gap in the range from 1.4 eV to 2.7 eV confirms considerable structural difference of amorphous carbon films obtained at different synthesis conditions. The influence of hydrogen on formation of structure is shown.
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