Abstract
Amorphous Ga2O3 thin films were deposited on SiO2 and sapphire substrates by pulsed magnetron sputtering (PSD) at room temperature, respectively. Corresponding amorphous Ga2O3 thin film photodetectors were prepared. The oxygen vacancies and defects of the interface between films and substrates were found to determine the discrepancy by comparing the performance between these two photodetectors. Amorphous Ga2O3 photodetectors on SiO2 had highly performances with a responsivity of 417 A/W, detectivity of 7.84 × 1012 Jones, and external quantum efficiency of 2.01 × 105 %.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
