Abstract
A new type of nonhydrogenated diamond-like carbon film defined as amorphous diamond (a-D) can be deposited from Enhanced Arc carbon source on various substrate materials such as Si, high speed steel (HSS) and WC at room temperature. The role of evaporation and condensation of highly ionized carbon plasma has been investigated in this study. Experimental results show that significant relationships exist between the energy distribution of the flux species, the particle surface interactions and the microstructure and mechanical properties of the a-D films. Films deposited in optimum conditions at growth rate of 6 μm h −1 exhibit high hardness and Young's modulus, with peak values measured by the nanoindentation technique of around 95 GPa and 1150 GPa respectively, approaching those of natural diamond. Furthermore, the specific possibility of the modified arc technique compared with other physical vapor deposition processes leads to excellent adhesion on various substrates. Scratch test measurements reveal values of 50 N–80 N on HSS and WC substrates respectively.
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