Abstract

To obtain quantitative information about the composition and bonding of atoms located at and beyond the analyzed solid surface nondestructively, we applied angle-resolved X-ray photoelectron spectroscopy aided by the maximum entropy method to air-exposed amorphous carbon nitride films deposited by pulsed laser deposition of diamond-like carbon modified by low-energy nitrogen ion bombardment during film growth. We demonstrate that the composition, chemical bonding, and mass density vary significantly from the top surface to a shallow subsurface region. The analyzed samples, in a shallow surface region of ∼1 nm, are composed of oxygen, nitrogen, hydrogen, and mostly carbon in sp2 hybridization. In a deeper region, the C sp3 content increases substantially going to a maximum, whereas the nitrogen percentage decreases to a minimum, then increases, and tends to saturate. Special attention has been paid to in-depth distributions of carbon atoms in trigonal and tetragonal arrangements because they specify numerous physical and chemical properties of carbon-based materials. These results indicate that the interaction of DLC:N surfaces with surroundings can be influenced, barring oxygen and nitrogen, by sp2-bonded carbon atoms located near the surface of the samples. The obtained results can be useful for developing a deeper understanding of the interaction between DLC:N layer surfaces and their surroundings and particularly with living tissue.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.