Abstract
Plasma-source ion implantation (PSII) is successfully employed without an external radio frequency plasma source to form a thin amorphous carbon layer on the surface of polyethylene terepthalate (PET) film by applying pulsed high negative voltage (∼10 μs pulse width, 300–900 pulses/s, −10 kV) to a sample immersed in C 2H 2 gas with and without Ar. This pulsed voltage condition is found to itself generate a plasma surrounding the substrate and PET film to form a thin carbon layer. The oxygen barrier characteristics of the PET were improved remarkably by this PSII processing, and laser Raman, X-ray photoelectron and Fourier-transform infrared spectroscopy spectra revealed that the thin amorphous carbon layer was found to consist primarily of graphite crystal with the characteristics of diamond-like carbon. The ratio of sp 2 (graphite) to sp 3 (diamond) populations was found to vary according to the gas pressure of C 2H 2 and the addition of Ar, which affects on the oxygen barrier characteristics.
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