Amorphous carbon and carbon nitride films synthesized by electrolysis of nitrogen-containing liquid

Abstract

Abstract Nitrogen-containing liquids N,N-dimethylformamide [HCON(CH3)2] and acrylonitrile (CH2CHCN) were selected as electrolytes in attempt to electrochemically deposit carbon nitride films on silicon substrates at atmospheric pressure and low temperature. The composition and bonding states in these films have been characterized by using X-ray photoelectron spectroscopy (XPS), Raman, and Fourier transform infrared (FTIR) measurements. It was evidenced that hydrogenated amorphous carbon nitride (α-CNx:H) films could be synthesized in acrylonitrile liquid, however, in N,N-dimethylformamide, only α-C:H:O films were obtained. These results indicate that electrodeposition of CNx films in the liquid phase is possible, and the selection of electrolytes and optimization of experimental parameters are the key factors in the liquid deposition process.