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Abstract
A new chelating adsorbent was prepared by grafting glycidyl methacrylate (GMA) onto polystyrene (PS) particles using simultaneous radiation technique and amination of graft copolymers by reacting with diethylenetriamine. The effects of various parameters such as, irradiation doses, inhibitor concentrations, amination temperature, and reaction time were investigated. The grafting yield increased with irradiation dose to reach its maximum value at 15 kGy. The accelerative effect of solvent medium on the grafting yield was higher in THF than DMF. The addition of 0.001 % (wt) inhibitor to the reaction medium led to a sharp increase of grafting yield. The best conversion ratio was obtained at 115 °C during 24 h. By using a column separation technique, the adsorption behaviors of the adsorbent toward Cd2+ and Nd3+ in aqueous solution were examined. The adsorption amount of both Cd2+ and Nd3+ increased with initial ions concentration. The maximum equilibrium of Cd2+ and Nd3+ adsorbed ions were 18.1 and 17.58 mg/g, respectively. It was observed that the functionalized GMA-g-PS was reusable by desorbing with 0.1 M nitric acid almost without losing their adsorption capacity. FTIR test indicates that epoxide and amine groups were introduced onto GMA-g-PS and aminated GMA-g-PS, respectively. The Tg of graft copolymer slightly decreased, and that of aminated GMA-g-PS was higher than graft copolymer.
Published Version
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