Abstract
Planar waveguides were fabricated from amorphous aluminum oxide (AlOx) for the visible and near-infrared spectra. AlOx films with the nominal thickness of $1~\mu \text{m}$ were deposited on glass substrates using pulsed-dc magnetron sputtering with RF substrate bias without substrate heating. Films were deposited using various combinations of pulsed-dc power and RF substrate bias to study the dependence of optical properties under a range of controlled ion energy and ion-to-neutral ratio. To observe changes in waveguide performance, samples were further annealed at 550 °C for 1 h in air. Optical properties of the waveguides were assessed using spectroscopic ellipsometry and lateral transmission measurements with prism coupling. Results show that by using high pulsed-dc power at the target, it is possible to achieve 1.5-dB/cm transmission loss without post-deposition annealing, enabling the deposition of AlOx films at high deposition rates with low transmission loss in applications with a low thermal budget.
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