Abstract
The Co2MnSi (CMS) Heusler alloy films with thickness d = 90 ÷ 110 nm were grown by DC magnetron sputtering on both nonheated and heated Si(100) and MgO(100) substrates. The films grown (annealed) at T ≥ 400°C demonstrated a nanocrystalline structure with a partially ordered B2 phase and traces of a highly ordered L21phase as found from XRD measurements. The films deposited onto the nonheated substrates followed by annealing atTann= 300 ÷ 500°C demonstrated a gradual increase of the saturation magnetisation,Msat, up to about 4.0μB/f.u. (at 295 K) while the coercity field,Hc, of the films increased from about 10 to 12 kA/m withTannincreasing from 400 to 500°C. Unusually lowHcvalues of about 0.1 and 0.3 kA/m have been indicated for the films grown in situ at 400°C on MgO and Si, respectively. A significant increase of the Hc values found for the films grown in situ atTs= 450°C and reducedMsatvalues for similar films grown at 500°C have been associated with the instability of the ordered L21structure at high temperatures.
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