Abstract
The need for efficient power converters is currently a major driver of GaN-on-Si research activities. Among several areas, a large research field is the engineering of enhancement mode devices. Several solutions have been provided in the past. Yet, almost all solutions either lack the compatibility with epitaxy on Si substrates (which is a necessity in terms of cost) or suffer from low positive threshold voltages (Vth) below +1 V. In power applications, there is definitely a need for higher values of Vth. In this paper, we propose the utilization of AlN barriers in conjunction with AlGaN channels to obtain Vth values of more than +3 V while still maintaining the low power-switching losses obtained in GaN-based heterostructure field-effect transistors.
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