Abstract
Alloying effect on tensile ductility of nanostructured Cu-X (X = Zr and W) thin films was studied in comparison. Both Zr and W atoms segregated at grain boundaries (GBs) and increased the GB cohesion energy, leading to similar increase of ductility in as-deposited Cu-X films. After annealing treatment, however, changes in ductility showed different alloying effect: the Cu-Zr one increased while the Cu-W one decreased when compared with their as-deposited counterparts. This discrepancy was rationalized by different microstructural evolution that intergranular CuZr amorphous layer was produced in the Cu-Zr film while intergranular W grains were formed in the Cu-W one.
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