All-fiber maskless lithographic technology to form microcircular interference pattern on Azo polymer film

Abstract

We report a novel all-fiber, maskless lithograpic technology to form various concentric grating patterns for micro zone plate on azo polymer film. The proposed technology is based on the interference pattern out of the cleaved end of a coreless silica fiber (CSF)-single mode fiber (SMF) composite. The light guided along SMF expands into the CSF segment to generate various circular interference patterns depending on the length of CSF. Interference patterns are experimentally observed when the CSF length is over a certain length and the finer spacing between the concentric rings are obtained for a longer CSF. By using beam propagation method (BPM) package, we could further investigated the concentric interference patterns in terms of intensity distribution and fringe spacing as a function of CSF length. These intereference patterns are directly projected over azo polymer film and their intensity distrubution formed surface relief grating (SRG) patterns. Compared to photoresist films azo polymer layers produce surface relief grating (SRG), where the actual mass of layer is modulated rather than refractive index. The geometric parameters of the CSF length as well as diameter and the spacing between the cleaved end of a CSF and azo polymer film, were found to play a major role to generate various concentric structures. With the demonstration of the circular SRG patterns, we confirmed that the proposed technique do have an ample potential to fabricate micro fresnel zone plate, that could find applications in lens arrays for optical beam formings as well as compact photonic devices.