Abstract
We report the development of all-diamond microelectrochemical devices, namely, a microelectrode array (MEA), in which a periodic array structure with well-defined diameters, distance, and hexagonal unit cell pattern is micromachined using a combination of state-of-the-art microwave-induced plasma growth and laser ablation shaping techniques to prepare and coat a patterned boron-doped diamond (BDD) substrate with an intrinsic diamond insulating layer. The active BDD element can be tuned to between 10 and 50 microm in diameter with a 10 times diameter center-to-center distance between two adjacent conducting elements, which are exactly coplanar to the dielectric surroundings. This type of device should enable applications in harsh conditions such as high temperature, high pressure, and resistive media under dynamic flow regimes.
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