Abstract
Arrays of aligned, horizontal nanochannels were fabricated by thermal oxidative self-sealing of grooves in Si wafers. The retarded oxidation at the concave corners at the bottoms of grooves results in the preservation of nanochannels, whereas above the bottoms, the oxide layers growing from the opposite walls of the grooves impinge.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
