Abstract
Thin film material of oriented multiwall carbon nanotubes was obtained by noncatalytical chemical vapor deposition in a glow-discharge plasma. The film phase composition, surface morphology, and structural features were studied by Raman and electron microscopy techniques. Low-voltage electron field emission of thin film nanotube material was obtained and examined in diode configuration. The I–V curves in Fowler–Nordheim coordinates were linear and the corresponding threshold average field was about 1.5 V/μm. The emission current density was up to 50 mA/cm2 at the field of 5 V/μm. The emission site density reached 107 cm−2 at the same value of electric field.
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