Abstract
A high-performance Al0.1Ga0.9N ultraviolet (UV) avalanche photodiode (APD) with a separate absorption and multiplication structure grown on AlN templates is fabricated by employing a triple-mesa structure. The fabricated AlGaN UV-APD exhibits a maximum gain up to 2.3 × 104 at the reverse bias of 67 V and a low avalanche breakdown voltage (<70 V). The triple-mesa structure is confirmed to significantly lower the avalanche breakdown voltage and reduce the sidewall leakage current in comparison with the conventional double-mesa one. These improvements are explained by the simulation of the electric field which shows a significant improvement in the distribution uniformity in the active regions and enhancement in the intensity in the multiplication region. In addition, the scaling effects of various anodes and mesas are investigated, and the dark current is found to decrease with a decrease in the mesa size thanks to the reduced amount in the high-conductivity threading dislocation that crosses the multiplication region.
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