Abstract

ABSTRACTAlGaN/GaN heterojunction field effect transistors (HFET) on sapphire substrates have demonstrated ability as power devices operating with high current densities and high breakdown voltages. Additionally, AlGaN/GaN HFET devices have a very low on-state resistance. This makes these devices ideal for automotive applications such as switching relays, DC-DC converters, and power inverters. By 2006, switching devices using GaN-based FETs are anticipated to be employed in luxury automobiles and transitioned to the mass market by 2009.In this presentation, data from AlGaN/GaN HFET's grown in an Emcore D180 MOCVD system will be presented. Typical production-scale material results (on 2” sapphire substrates) for these wafers were: μ ∼ 1000 cm2/Vs, Ns = 1.0×1013 cm−2, and Rs ∼ 450 Ω/square with <3% variation across the wafer. These wafers were then processed into devices using Pt/Au gate contacts with 2 μm gate length, 200 μm gate width, and a source to drain spacing of 13 μm. A total of 1000 FETs were combined in parallel for an effective gate width of 20 cm for high current operation (10A). These devices have a lower on-state resistance (<0.01 Ω-cm2) and higher Schottky breakdown voltages (400 V) than the theoretical limit of Si MOSFET devices. These devices demonstrate suitability for insertion in automotive electrical harnesses.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.